Read e-book online Ion Beams in Materials Processing and Analysis PDF

By Bernd Schmidt, Klaus Wetzig

ISBN-10: 321199355X

ISBN-13: 9783211993552

ISBN-10: 3211993568

ISBN-13: 9783211993569

ISBN-10: 3211993576

ISBN-13: 9783211993576

A accomplished evaluation of ion beam software in glossy fabrics learn is equipped, together with the fundamentals of ion beam physics and know-how. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is taken care of intimately. Its functions in fabrics learn, improvement and research, advancements of particular recommendations and interplay mechanisms of ion beams with reliable nation subject bring about the optimization of latest fabric homes, that are mentioned completely. Solid-state houses optimization for sensible fabrics similar to doped semiconductors and steel layers for nano-electronics, steel alloys, and nano-patterned surfaces is established. The ion beam is a crucial device for either fabrics processing and research. Researchers engaged in solid-state physics and fabrics examine, engineers and technologists within the box of recent sensible fabrics will welcome this text.

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Bohr N (1941) Velocity-range relation for fission fragments. Phys Rev 59:270–275 7. Bohr N (1948) The penetration of atomic particles through matter. Mat Fys Medd 18:8f 8. Gibson JB et al (1960) Dynamics of radiation damage. Phys Rev 120:1229–1253 9. Eckstein W (1991) Computer simulation of ion-solid interactions, vol 10, Springer series in materials science. Springer, Berlin 10. Carter G, Grant WA (1976) Ion implantation of semiconductors. Arnold, London 11. Thompson MW (1969) Defects and radiation damage in metals.

In the weak damage range I the defect density increases continuously with growing implantation fluence. In the medium damage range II the implantation temperature-dependent plateau exists, characterized by an equilibrium between defect generation and annihilation. , for cooled samples) the defect recombination only plays a minor role. Further increasing of the implantation fluence causes an enhanced defect accumulation and a collapse-like target amorphization will take place (region III). 2 Surface-sensitive material properties influenced by ion implantation Mechanical Chemical Optical/electronic Adhesion, lubrication, friction Electrochemistry Refractive index Hardening, wear fatigue Catalysis, oxidation resistance Magnetic properties, reflectance Ion implantation also modifies surface-sensitive material properties introducing impurities and structural changes in the host matrix.

Feldman LC, Mayer JW, Picraux ST (1982) Materials analysis by ion channeling. Academic, New York 38. Nastasi M (2012) Ion beam analysis: fundamentals and applications. Tailor & Francis, London 39. Robinson MT, Oen OS (1963) The channeling of energetic atoms in crystal lattices. Appl Phys Lett 2:30–32 40. Ziegler JF, Biersack JP, Littmark U (1985) The stopping and range of ions in solids. Pergamon, New York 41. Picraux ST, Andersen JU (1969) Measurements and calculations of critical angles for planar channeling.

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Ion Beams in Materials Processing and Analysis by Bernd Schmidt, Klaus Wetzig

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