Download e-book for kindle: Plasma processing of nanomaterials by R. Mohan Sankaran

By R. Mohan Sankaran

ISBN-10: 1439866767

ISBN-13: 9781439866764

We are at a serious evolutionary juncture within the examine and improvement of low-temperature plasmas, that have develop into necessary to synthesizing and processing important nanoscale fabrics. progressively more industries are more and more depending on plasma expertise to enhance built-in small-scale units, yet actual limits to development, and different demanding situations, threaten growth.

Plasma Processing of Nanomaterials is an in-depth advisor to the artwork and technology of plasma-based chemical tactics used to synthesize, strategy, and adjust a variety of periods of nanoscale fabrics resembling nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma expertise allows quite a lot of educational and business purposes in fields together with electronics, textiles, automotives, aerospace, and biomedical. a first-rate instance is the semiconductor undefined, within which engineers revolutionized microelectronics by utilizing plasmas to deposit and etch skinny motion pictures and fabricate built-in circuits.

An assessment of growth and destiny capability in plasma processing, this reference illustrates key experimental and theoretical facets via providing useful examples of:

  • Nanoscale etching/deposition of skinny films
  • Catalytic development of carbon nanotubes and semiconductor nanowires
  • Silicon nanoparticle synthesis
  • Functionalization of carbon nanotubes
  • Self-organized nanostructures

 

Significant advances are anticipated in nanoelectronics, photovoltaics, and different rising fields as plasma know-how is additional optimized to enhance the implementation of nanomaterials with well-defined dimension, form, and composition. relocating clear of the standard concentrate on rainy innovations embraced in chemistry and physics, the writer sheds gentle on pivotal breakthroughs being made via the smaller plasma neighborhood. Written for a various viewers operating in fields starting from nanoelectronics and effort sensors to catalysis and nanomedicine, this source may also help readers increase improvement and alertness of nanomaterials of their personal paintings.

About the Author:

R. Mohan Sankaran acquired the yank Vacuum Society’s 2011 Peter Mark Memorial Award for his impressive contributions to tandem plasma synthesis.

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B—Solid State Mater. Adv. Technol. 1996, 40 (2–3), 101–118; (e) Yonts, O. ; Harrison, D. , Surface cleaning by cathode sputtering. J. Appl. Phys. 1960, 31 (9), 1583–1584. 46. (a) Mogab, C. ; Adams, A. ; Flamm, D. , Plasma etching of Si and SiO2— Effect of oxygen additions to Cf4 Plasmas. J. Appl. Phys. , Spectroscopic diagnostics of Cf4-O2 plasmas during Si and SiO2 etching processes. J. Appl. Phys. , Langmuir probe measurements on Chf3 and Cf4 plasmas—The role of ions in the reactive sputter etching of SiO2 and Si.

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Plasma processing of nanomaterials by R. Mohan Sankaran


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